Английская Википедия:180 nm process

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Шаблон:Short description Шаблон:Semiconductor manufacturing processes The 180 nm process is a MOSFET (CMOS) semiconductor process technology that was commercialized around the 1998–2000 timeframe by leading semiconductor companies, starting with TSMC[1] and Fujitsu,[2] then followed by Sony, Toshiba,[3] Intel, AMD, Texas Instruments and IBM.

History

The origin of the 180 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years.Шаблон:Citation needed The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS).

Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a gate length shorter than that of light used for contemporary lithography, which had a wavelength of 193 nm.Шаблон:Citation needed

Some more recentШаблон:When microprocessors and microcontrollers (e.g. PIC) are using this technology because it is typically low cost and does not require upgrading of existing equipment.Шаблон:Citation needed In 2022, Google sponsored open-source hardware projects using GlobalFoundries 180nm MCU (microcontroller) process on multi-project wafers.[4]

In 1988, an IBM research team led by Iranian engineer Bijan Davari fabricated a 180Шаблон:Nbspnm dual-gate MOSFET using a CMOS process.[5] The 180Шаблон:Nbspnm CMOS process was later commercialized by TSMC in 1998,[1] and then Fujitsu in 1999.[2]

Processors using 180 nm manufacturing technology

References

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