Английская Википедия:1 µm process

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Шаблон:Short description Шаблон:Use dmy dates Шаблон:More citations needed Шаблон:Semiconductor manufacturing processes The 1 μm process (1 micrometre process) is a level of MOSFET semiconductor process technology that was commercialized around the 1984–1986 timeframe,[1][2] by leading semiconductor companies like NTT, NEC, Intel and IBM. It was the first process where CMOS was common (as opposed to NMOS).

The earliest MOSFET with a 1Шаблон:Nbspμm NMOS channel length was fabricated by a research team led by Robert H. Dennard, Hwa-Nien Yu and F.H. Gaensslen at the IBM T.J. Watson Research Center in 1974.[3]

Products featuring 1.0 μm manufacturing process

References

  1. 1,0 1,1 Шаблон:Cite web
  2. Шаблон:Cite web
  3. Шаблон:Cite journal
  4. Шаблон:Cite web
  5. Шаблон:Cite web
  6. Intel Corporation, "New Product Focus: Components: Two-and Four-Megabit EPROMs are High-Density Performers", Microcomputer Solutions, September/October 1989, page 14
  7. Intel Corporation, "New Product Focus: Components: New ASSP Suits Mobile Applications", Microcomputer Solutions, September/October 1990, page 11

External links

Шаблон:Sequence


Шаблон:Nano-tech-stub