Английская Википедия:Burn-Jeng Lin

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Шаблон:Short description Burn-Jeng Lin (Шаблон:Zh; born 1942) is a Taiwanese electrical engineer.

Education

After graduating from National Taiwan University in 1963 with a degree in electrical engineering, Lin earned his doctorate in the same subject from Ohio State University in 1970.[1][2]

Career

During his tenure at IBM, which began in 1970,[3] Lin became the first to propose immersion lithography, a technique that became viable in the 1980s.[4][5] Lin left IBM to found his own company, Linnovation, Inc., in 1992. He began working for TSMC in 2000.[6] Lin was named an IEEE Fellow in 2003, and granted an equivalent honor by the SPIE. The next year, SPIE gave Lin the inaugural Frits Zernike Award.[7] In 2008, Lin was elected to membership of the United States National Academy of Engineering "for technical innovations and leadership in the development of lithography for semiconductor manufacturing."[8] Lin received the IEEE Cledo Brunetti Award and IEEE Jun-ichi Nishizawa Medal in 2009 and 2013 respectively.[2][5] In 2014, Lin was named a member of Academia Sinica.[1][7] Upon his retirement from TSMC, he was offered a position on the faculty of National Tsing Hua University.[7][9]

References

Шаблон:Reflist Шаблон:Authority control

  1. 1,0 1,1 Шаблон:Cite news
  2. 2,0 2,1 Шаблон:Cite news
  3. Шаблон:Cite web
  4. Burn J. Lin (1987). "The future of subhalf-micrometer optical lithography". Microelectronic Engineering 6, 31–51
  5. 5,0 5,1 Шаблон:Cite news
  6. Шаблон:Cite news
  7. 7,0 7,1 7,2 Шаблон:Cite news
  8. Шаблон:Cite news
  9. Шаблон:Cite news